High thermal stability and dielectric performance of phenylhydrazine-based Schiff base oligomers obtained via oxidative polycondensation

In this study, the 2-PHMBD Schiff base, synthesized through the condensation of 2,4-dihydroxybenzaldehyde (2,4-DHBA) with phenylhydrazine (PH), was subjected to oxidative polymerization in a basic medium using hydrogen peroxide (H2O2), sodium hypochlorite (NaOCl), and molecular oxygen (O2) as oxidizing agents. Three oligomers, designated as o-(2-PHMBD)-P, o-(2-PHMBD)-H, and o-(2-PHMBD)-O, were successfully obtained and comprehensively characterized by FT-IR, 1H-13C-NMR, UV-Vis, CV, GPC, SEM, TGA, and DSC analyses. Spectroscopic results confirmed the successful polymerization, while morphological and thermal analyses revealed the distinct physical characteristics of the oligomers. According to GPC data, o-(2-PHMBD)-H exhibited the highest average molecular weight of 4700 Da, and TGA analysis demonstrated that o-(2-PHMBD)-O had the highest thermal stability with a residue of 46% at 1000 degrees C. The DSC results showed the highest glass transition temperature of 132 degrees C for o-(2-PHMBD)-H. UV-Vis and CV measurements indicated reduced optical and electrochemical band gaps compared with the monomer, with the lowest optical band gap determined as 2.74 eV. Dielectric measurements revealed that o-(2-PHMBD)-H displayed the highest dielectric constant of 2.57 and conductivity of 2.49 x 10(-)7 S cm(-)1. These results demonstrate that phenylhydrazine-based Schiff base oligomers possess high thermal stability and favorable dielectric properties, making them promising materials for optoelectronic and dielectric device applications.