Influence of Different Aluminum Sources on the NH3 Gas-Sensing Properties of ZnO Thin Films

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dc.authoridDemiri, Sani/0000-0001-7756-3758
dc.contributor.authorOzutok, Fatma
dc.contributor.authorKaraduman, Irmak
dc.contributor.authorDemiri, Sani
dc.contributor.authorAcar, Selim
dc.date.accessioned2025-01-27T20:12:09Z
dc.date.available2025-01-27T20:12:09Z
dc.date.issued2018
dc.departmentÇanakkale Onsekiz Mart Üniversitesi
dc.description.abstractHerein we report Al-doped ZnO films (AZO) deposited on the ZnO seed layer by chemical bath deposition method. Al powder, Al oxide and Al chloride were used as sources for the deposition process and investigated for their different effects on the NH3 gas-sensing performance. The morphological and microstructural properties were investigated by employing x-ray powder diffraction, scanning electron microscopy analysis and energy-dispersive x-ray spectroscopy. The characterization studies showed that the AZO thin films are crystalline and exhibit a hexagonal wurtzite structure. Ammonia (NH3) gas-sensing measurements of AZO films were performed at different concentration levels and different operation temperatures from 50 degrees C to 210 degrees C. The sample based on powder-Al source showed a higher response, selectivity and short response/recovery time than the remaining samples. The powder Al sample exhibited 33% response to 10-ppm ammonia gas at 190 degrees C, confirming a strong dependence on the dopant source type.
dc.description.sponsorshipCanakkale University Scientific Research Project [FDK-2015-470]; Gazi University Scientific Research Fund [05/2016-21]
dc.description.sponsorshipThis work is supported by Canakkale University Scientific Research Project No. FDK-2015-470 and Gazi University Scientific Research Fund Project No. 05/2016-21.
dc.identifier.doi10.1007/s11664-018-6099-7
dc.identifier.endpage2657
dc.identifier.issn0361-5235
dc.identifier.issn1543-186X
dc.identifier.issue5
dc.identifier.scopus2-s2.0-85041547642
dc.identifier.scopusqualityQ2
dc.identifier.startpage2648
dc.identifier.urihttps://doi.org/10.1007/s11664-018-6099-7
dc.identifier.urihttps://hdl.handle.net/20.500.12428/20859
dc.identifier.volume47
dc.identifier.wosWOS:000428819300016
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherSpringer
dc.relation.ispartofJournal of Electronic Materials
dc.relation.publicationcategoryinfo:eu-repo/semantics/openAccess
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20250125
dc.subjectAZO films
dc.subjectchemical bath deposition
dc.subjectsource solution
dc.subjectNH3 gas sensor
dc.titleInfluence of Different Aluminum Sources on the NH3 Gas-Sensing Properties of ZnO Thin Films
dc.typeArticle

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