3,4-Dimethoxy phenyl thiosemicarbazone as an effective corrosion inhibitor of copper under acidic solution: comprehensive experimental, characterization and theoretical investigations

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dc.authoridALLAL, Hamza/0000-0002-8095-7421
dc.authoridBoublia, Abir/0000-0003-1669-4951
dc.authoridferkous, Hana/0000-0002-2445-6147
dc.contributor.authorBenachour, Naima
dc.contributor.authorDelimi, Amel
dc.contributor.authorAllal, Hamza
dc.contributor.authorBoublia, Abir
dc.contributor.authorSedik, Amel
dc.contributor.authorFerkous, Hana
dc.contributor.authorDjedouani, Amel
dc.date.accessioned2025-01-27T20:10:31Z
dc.date.available2025-01-27T20:10:31Z
dc.date.issued2024
dc.departmentÇanakkale Onsekiz Mart Üniversitesi
dc.description.abstractThis study investigates the corrosion inhibition potential of 3,4-dimethoxy phenyl thiosemicarbazone (DMPTS) for copper in 1 M hydrochloric acid (HCl) solutions, aiming to disclose the mechanism behind its protective action. Through an integrative methodology encompassing electrochemical analyses-such as weight loss measurements, potentiodynamic polarization, and electrochemical impedance spectroscopy (EIS)-we quantitatively evaluate the corrosion protection efficacy of DMPTS. It was determined that the optimal concentration of DMPTS markedly boosts the corrosion resistance of copper, achieving an impressive inhibition efficiency of up to 89% at 400 ppm. The formation of a protective layer on the copper surface, a critical aspect of DMPTS's inhibitory action, was characterized using Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). These techniques provided empirical evidence of surface morphology modifications and roughness changes, affirming the formation of a protective barrier against corrosion. A significant advancement in our study was the application of Attenuated Total Reflectance Fourier Transform Infrared (ATR-FTIR) spectroscopy, which identified chemical adsorption as the definitive mechanism of corrosion inhibition by DMPTS. The ATR-FTIR results explicitly demonstrated the specific interactions between DMPTS molecules and the copper surface, indicative of a robust protective adsorbed layer formation. This mechanistic insight, crucial to understanding the inhibitory process, aligns with the protective efficacy observed in electrochemical and surface analyses. Theoretical support, provided by the Quantum Theory of Atoms in Molecules (QTAIM) and quantum chemical computations, further validated the strong molecular interaction between DMPTS and copper, corroborating the experimental findings. Collectively, this research not only confirms the superior corrosion inhibition performance of DMPTS in an acidic setting but also elucidates the chemical adsorption mechanism as the foundation of its action, offering valuable insights for the development of effective corrosion inhibitors in industrial applications. This study investigates the corrosion inhibition potential of 3,4-dimethoxy phenyl thiosemicarbazone (DMPTS) for copper in 1 M hydrochloric acid (HCl) solutions, aiming to disclose the mechanism behind its protective action.
dc.description.sponsorshipMinistry of Higher Education and Scientific Research, Ferhat ABBAS Setif 1 University; Directorate General for Scientific Research and Technological Development (DGRSDT), Algeria; King Saud University, Riyadh, Saudi Arabia; [RSP2024R113]
dc.description.sponsorshipThe authors gratefully acknowledge the funding from Researchers Supporting laboratoire de Genie mecanique et Materiaux, Faculte de Technologie, University 20 Aout 1955-Skikda, Skikda, 21000, Algeria, and the Ministry of Higher Education and Scientific Research, Ferhat ABBAS Setif 1 University, the Directorate General for Scientific Research and Technological Development (DGRSDT), Algeria. The authors are thankful to the Researchers Supporting Project (RSP2024R113), King Saud University, Riyadh, Saudi Arabia.
dc.identifier.doi10.1039/d3ra08629a
dc.identifier.endpage12555
dc.identifier.issn2046-2069
dc.identifier.issue18
dc.identifier.pmid38689800
dc.identifier.scopus2-s2.0-85192072601
dc.identifier.scopusqualityQ1
dc.identifier.startpage12533
dc.identifier.urihttps://doi.org/10.1039/d3ra08629a
dc.identifier.urihttps://hdl.handle.net/20.500.12428/20648
dc.identifier.volume14
dc.identifier.wosWOS:001209692600001
dc.identifier.wosqualityN/A
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.indekslendigikaynakPubMed
dc.language.isoen
dc.publisherRoyal Soc Chemistry
dc.relation.ispartofRsc Advances
dc.relation.publicationcategoryinfo:eu-repo/semantics/openAccess
dc.rightsinfo:eu-repo/semantics/openAccess
dc.snmzKA_WoS_20250125
dc.subject1 M Hcl
dc.subjectMild-Steel
dc.subjectSchiff-Base
dc.subjectCarbon-Steel
dc.subjectDerivatives
dc.subjectAdsorption
dc.subjectCoatings
dc.title3,4-Dimethoxy phenyl thiosemicarbazone as an effective corrosion inhibitor of copper under acidic solution: comprehensive experimental, characterization and theoretical investigations
dc.typeArticle

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