Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method

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dc.authoridGöktaş, Hilal / 0000-0003-2897-0036
dc.authoridKaya, İsmet / 0000-0002-9813-2962
dc.authoridAtalay, Betül / 0000-0001-5865-0039
dc.contributor.authorGöktaş, Hilal
dc.contributor.authorMansuroğlu, Doğan
dc.contributor.authorAtalay, Betül
dc.contributor.authorBilikmen, Sinan
dc.contributor.authorKaya, İsmet
dc.date.accessioned2025-01-27T21:01:58Z
dc.date.available2025-01-27T21:01:58Z
dc.date.issued2012
dc.departmentÇanakkale Onsekiz Mart Üniversitesi
dc.description.abstractThe synthesis of polyfluorene (PF) thin films by simultaneously superposing a continuous and pulsed discharge and the characterizations of these samples are presented. The double discharge plasma system is constructed by superposing two discharges; namely, a low pressure dc glow one and a high current pulsed one. The fluorene monomer in powder form was vaporized in the system at argon plasma without any modification, at 0.5 mbar operating pressure. The structure of the thin films was investigated via XPS, UV-visible, FTIR, XRD and SEM. The FTIR and the UV-visible results revealed that the fluorene structure was retained at the produced samples. Semi-conducting behavior was established, and upon the iodine doping, the optical energy band gap (E-g) dropped down from 3.7 to 2.4 eV. The morphology of the synthesized PF thin films was amorphous, with granular structures of different sizes depending on the location of the substrate.
dc.identifier.doi10.1007/s11090-011-9334-z
dc.identifier.endpage44
dc.identifier.issn0272-4324
dc.identifier.issn1572-8986
dc.identifier.issue1
dc.identifier.scopus2-s2.0-84859546659
dc.identifier.scopusqualityQ1
dc.identifier.startpage35
dc.identifier.urihttps://doi.org/10.1007/s11090-011-9334-z
dc.identifier.urihttps://hdl.handle.net/20.500.12428/27244
dc.identifier.volume32
dc.identifier.wosWOS:000304172300003
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherSpringer
dc.relation.ispartofPlasma Chemistry and Plasma Processing
dc.relation.publicationcategoryinfo:eu-repo/semantics/openAccess
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20250125
dc.subjectDouble discharge
dc.subjectFilamentary discharge
dc.subjectPlasma polymerization
dc.subjectPolyfluorene
dc.subjectThin films
dc.titlePolyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method
dc.typeArticle

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